Fabrication of carbon nanomembranes by helium ion beam lithography

scientific article published on 21 February 2014

Fabrication of carbon nanomembranes by helium ion beam lithography is …
instance of (P31):
scholarly articleQ13442814

External links are
P356DOI10.3762/BJNANO.5.20
P932PMC publication ID3943867
P698PubMed publication ID24605285
P5875ResearchGate publication ID260612433

P50authorArmin GölzhäuserQ43288232
André BeyerQ57079674
Xianghui ZhangQ60090845
Henning ViekerQ108557443
P2860cites workModification and stability of aromatic self-assembled monolayers upon irradiation with energetic particles.Q33251516
A model of secondary electron imaging in the helium ion scanning microscopeQ33415817
Contrast mechanisms and image formation in helium ion microscopyQ33418032
Precision cutting and patterning of graphene with helium ions.Q33509972
Mechanical characterization of carbon nanomembranes from self-assembled monolayersQ34132969
Digging gold: keV He(+) ion interaction with Au.Q41896203
Molecular mechanisms of electron-induced cross-linking in aromatic SAMs.Q45988181
Fabrication of molecular nanotemplates in self-assembled monolayers by extreme-ultraviolet-induced chemical lithographyQ46931899
On the validity of the Arrhenius equation for electron attachment rate coefficients.Q51889599
DNA Strand Breaks Induced by 0–4 eV Electrons: The Role of Shape ResonancesQ57984408
A Universal Scheme to Convert Aromatic Molecular Monolayers into Functional Carbon NanomembranesQ62678091
Mechanically Stacked 1-nm-Thick Carbon Nanosheets: Ultrathin Layered Materials with Tunable Optical, Chemical, and Electrical PropertiesQ62678108
Chemically Functionalized Carbon Nanosieves with 1-nm ThicknessQ62678125
Novel carbon nanosheets as support for ultrahigh-resolution structural analysis of nanoparticlesQ62678136
Resonant formation of DNA strand breaks by low-energy (3 to 20 eV) electronsQ64388650
P304page(s)188-194
P577publication date2014-02-21
P1433published inBeilstein Journal of NanotechnologyQ814756
P1476titleFabrication of carbon nanomembranes by helium ion beam lithography
P478volume5

Reverse relations

cites work (P2860)
Q47120195Amplified cross-linking efficiency of self-assembled monolayers through targeted dissociative electron attachment for the production of carbon nanomembranes.
Q38855793Carbon Nanomembranes
Q43154117Focused particle beam-induced processing
Q35690334Scanning reflection ion microscopy in a helium ion microscope

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