Titanium oxynitride thin films sputter deposited by the reactive gas pulsing process

scholarly article by Jean-Marie Chappé et al published April 2007 in Applied Surface Science

Titanium oxynitride thin films sputter deposited by the reactive gas pulsing process is …
instance of (P31):
scholarly articleQ13442814

External links are
P356DOI10.1016/J.APSUSC.2006.12.004

P2093author name stringNicolas Martin
Fabrice Sthal
Guy Terwagne
Jamal Takadoum
Jean-Marie Chappé
Jan Lintymer
P433issue12
P921main subjectthin filmQ1137203
titaniumQ716
P304page(s)5312-5316
P577publication date2007-04-01
P1433published inApplied Surface ScienceQ2772524
P1476titleTitanium oxynitride thin films sputter deposited by the reactive gas pulsing process
P478volume253

Reverse relations

cites work (P2860)
Q59046178Development of Dye-Sensitized Solar Cells with Sputtered N-DopedTiO2Thin Films: From Modeling the Growth Mechanism of the Films to Fabrication of the Solar Cells
Q58375460Flash annealing influence on structural and electrical properties of TiO2/TiO/Ti periodic multilayers
Q58375499Structural analysis of W3O/WO3 and TiO/TiO2 periodic multilayer thin films sputter deposited by the reactive gas pulsing process
Q58375468Structural and electrical properties in tungsten/tungsten oxide multilayers
Q48567340The Derivo Embolization Device, a Second-Generation Flow Diverter for the Treatment of Intracranial Aneurysms, Evaluated in an Elastase-Induced Aneurysm Model