Structural and electronic properties of titanium dioxide

scientific article published on 01 July 1992

Structural and electronic properties of titanium dioxide is …
instance of (P31):
scholarly articleQ13442814

External links are
P356DOI10.1103/PHYSREVB.46.1284
P698PubMed publication ID10003766

P50authorJames R. ChelikowskyQ16203752
P2093author name stringGlassford KM
P433issue3
P407language of work or nameEnglishQ1860
P921main subjecttitanium dioxideQ193521
P304page(s)1284-1298
P577publication date1992-07-01
P1433published inPhysical Review BQ2284414
P1476titleStructural and electronic properties of titanium dioxide
P478volume46

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cites work (P2860)
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Q74403533Dielectric constants and Born effective charges of TiO2 rutile
Q60297719Electron-pinned defect-dipoles for high-performance colossal permittivity materials
Q78114927Electronic and geometrical structure of rutile surfaces
Q74377971Electronic structure of TiO2:Ru
Q78130371Electronic structure of point defects in rutile TiO2
Q78116094Electronic structure of ultrathin Fe films on TiO2(110) studied with soft-x-ray photoelectron spectroscopy and resonant photoemission
Q78156887First-principles study of a tilt grain boundary in rutile
Q58375460Flash annealing influence on structural and electrical properties of TiO2/TiO/Ti periodic multilayers
Q60489321Formation of titanium monoxide (001) single-crystalline thin film induced by ion bombardment of titanium dioxide (110)
Q58375551High rate and process control of reactive sputtering by gas pulsing: the Ti–O system
Q77520808Local field effects in the electron energy loss spectra of rutile TiO2
Q62515989Spinodal equation of state for rutileTiO2
Q58375499Structural analysis of W3O/WO3 and TiO/TiO2 periodic multilayer thin films sputter deposited by the reactive gas pulsing process
Q58195326The Influence of Defects on Mo-Doped TiO2 by First-Principles Studies
Q29038146The surface science of titanium dioxide

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